Produkt mají v nabídce:
Spacer Engineered FinFET Architectures - Dasgupta, Sudeb a Kaushik, Brajesh Kumar a Pal, Pankaj Kumar
This book focusses on the spacer engineering aspects of novel MOS-based device-circuit co-design in sub-20nm technology node, its process complexity, variability, and reliability issues. It comprehensively explores the FinFET/tri-gate architectures with their circuit/SRAM suitability and tolerance to random statistical variations.
